Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-00 |
filingDate |
2012-10-19^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d664a2a31377ce69eb486c99d12a8ba4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_603bee38b614f63a508dca335e885792 |
publicationDate |
2013-05-01^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2586806-A2 |
titleOfInvention |
Modified novolak phenolic resin, making method, and resist composition |
abstract |
A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt% of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt% of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108732868-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108732868-A |
priorityDate |
2011-10-25^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |