| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80713b1ded8e1b89fbd40bcb7588346a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-27 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2011-12-14^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eb0033c9f84b012da483c5c1870cb20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5566453da9ea2a8ce0dc621c0c4b54d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab3fd678c0db6fc5be9825ec2054479e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94dc10f5ddc6f6689f71c0502c624b82 |
| publicationDate |
2013-10-30^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2656375-A2 |
| titleOfInvention |
A microwave plasma reactor for manufacturing synthetic diamond material |
| abstract |
A microwave plasma reactor for manufacturing a synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom, wherein the microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber comprises: an annular dielectric window formed in one or several sections; a coaxial waveguide having a central inner conductor and an outer conductor for feeding microwaves to the annular dielectric window; and a waveguide plate comprising a plurality of apertures disposed in an annular configuration with a plurality of arms extending between the apertures, each aperture forming a waveguide for coupling microwaves towards the plasma chamber. |
| priorityDate |
2010-12-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |