abstract |
A method for the fabrication of a nanoporous metal -based film, the method comprising the steps of providing a ceramic aerogel substrate having a nanoporous structure, wherein the substrate comprises a bulk portion and a surface portion and wherein the surface portion is chemically or physically modified; and depositing a metal or a metal oxide from a deposition source on the ceramic aerogel substrate by a physical vapor deposition (PVD) process, wherein the deposition is performed at a power of less than about 90W or at a current ranging from about 0.5 mA to about 100 mA. Further provided is a nanoporous metal -based film supported on a ceramic aerogel substrate having a nanoporous 10 structure, wherein the nanoporous structure of the aerogel defines the nanoporous structure of the metal-based film. |