| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2223-633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2223-076
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2223-61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2223-6116 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30612 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-223 |
| filingDate |
2019-07-29^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_330ade9607fc505adf9cb686f2c0e7ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3710864368cca89f8933be0feab95055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73e3eee72e8326c9776f5d3803c1e15b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e6431a9b83b3a3a8c386c638aa66565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd40a8456992a810d4bede1ce8810c76 |
| publicationDate |
2020-03-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-3620779-A1 |
| titleOfInvention |
Processing system, determining method with regard to catalytic layer of noble metal, and manufacturing method of product |
| abstract |
According to one embodiment, in a processing system (1) and determining method, a X-ray intensity (I) of character X-rays generated by irradiating a catalytic layer (22) of a noble metal formed on a surface of a substrate (21) with X-rays is detected. In the processing system (1) and the determining method, either the detected X-ray intensity (I) or a parameter calculated using the X-ray intensity (I) is obtained as a determination parameter. In the processing system (1) and the determining method, based at least on the determination parameter, whether or not the catalytic layer (22) has been formed into a state suitable for etching the surface of the substrate (21) is determined. |
| priorityDate |
2018-08-09^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |