http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3961676-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate | 2021-08-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_644dc592a1857e788834137cfd38d763 |
| publicationDate | 2022-03-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-3961676-A1 |
| titleOfInvention | Etching method and photosensitive resin composition |
| abstract | To provide an etching method capable of forming a hole having a small diameter or a groove having a narrow width in a substrate, using an etchant, and a photosensitive resin composition for use in the etching method. An etching method, comprising: a coating step of forming a coating film by applying a photosensitive resin composition to a substrate, an exposure step of position-selectively exposing the coating film, a developing step of developing a coating film after exposure to expose a part of the substrate and obtain a patterned cured product, an etching step of etching the substrate to form a hole or groove in the substrate, with the etching being performed in the presence of a noble metal catalyst, using the patterned cured product as a mask and an aqueous solution including a corrosive agent and an oxidizing agent as an etchant, and a stripping step of stripping a patterned cured product after the etching step, from the substrate, wherein the photosensitive-resin composition comprises a resin (A), a photosensitizer (B), and a solvent (S), and wherein the resin (A) is a novolak resin. |
| priorityDate | 2020-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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