http://rdf.ncbi.nlm.nih.gov/pubchem/patent/ES-2122916-B1

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filingDate 1996-10-30^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1999-08-16^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e6fefe696c0cb8d022242f938238a45
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publicationDate 1999-08-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber ES-2122916-B1
titleOfInvention ESTERS OF OXIMSULPHONIC ACIDS AND THEIR USE AS LATENT SULPHONIC ACIDS.
abstract ESTERS OF OXIMSULPHONIC ACIDS AND THEIR USE AS LATENT SULPHONIC ACIDS. THE INVENTION REFERS TO THE USE OF OXIMSULFONIC ACID ESTERS ACCORDING TO FORMULA I IN WHICH M IS 0 O 1, X IS 1 O 2; R1 REPRESENTS FOR EXAMPLE FENYL SUBSTITUTED, R2 HAS FOR EXAMPLE, ONE OF THE DEFINITIONS OF R1 OR DENOTA FENYL INSUBSTITUTED, ALCANOYLL WITH 1 TO 6 CARBON ATOMS, INSTITUTED BENZOYLON, 2-AXYLOXYBUTYL, AND OR R1 AND R2, FOR EXAMPLE, IN THEIR CASE TOGETHER FORM A RING WITH GROUP CO, R3 WHEN X IS EQUAL TO 1 REPRESENTS FOR EXAMPLE I RENT WITH 1 TO 18 ATOMS OF CARBON, PHENYLL OR FENANTRILE, IN WHICH THE PHENYL AND PHENYL RADICALS THEY MAY BE OF THE INSUBSTITUTED OR SUBSTITUTED TYPE OR R3 WHEN X IS EQUAL TO 2, DENOTED FOR EXAMPLE ALKYLENE WITH 2 TO 12, PHENYLENE OR WELL OXIDIPHENYLENE, AS THE SUBSTITUTED, OXIDIFENYLENE, OR SUBSTITUTE TYPES ARE OF A SUBSTITUTE OR SUBSTITUTE TYPE. LATENT ACIDS, ESPECIALLY IN THE CASE OF WAVE LENGTHS OF MORE THAN 390 NM, INCLUDING THE USE OF SUCH COMPOUNDS FOR THE ELABORATION OF PHOTO-RESISTANT MATERIALS.
priorityDate 1995-10-31^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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