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publicationDate 2017-02-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber ES-2602565-T3
titleOfInvention Monocrystalline silicon carbide ingot, and epitaxial substrate and wafer obtained from the monocrystalline silicon carbide ingot
abstract A single crystal silicon carbide ingot, comprising single crystal silicon carbide containing a donor-type impurity at a concentration of 2 x 1018 cm-3 to 6 x 1020 cm-3 and an acceptor-type impurity at a concentration of 1 x 1018 cm-3 to 5.99 x 1020 cm-3 and where the concentration of the donor-type impurity is greater than the concentration of the acceptor-type impurity and the difference is 1 x 1018 cm-3 at 5.99 x 1020 cm-3.
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