http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2516911-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2bb724dd58cbb2a73b244e79b0c9e42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C21-005 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 |
| filingDate | 1982-11-22^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2a367b14574455786e1ebafa95b475c |
| publicationDate | 1983-05-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | FR-2516911-A1 |
| titleOfInvention | LOW TEMPERATURE REDUCTION PROCESS FOR PHOTOMASKS |
| abstract | GLASS PHOTOMASKS, CARRYING A HIGH RESOLUTION IMPREGNATED DESIGN AND INTENDED TO BE USED IN PHOTOLITHOGRAPHIC MANUFACTURING OPERATIONS, ARE PREPARED BY MIGRATION OF STAIN-FORMING IONS BY IMPREGNATION INTO THE SURFACE OF A GLASS SUBSTRATE AND AGGREGATION AND BY REDUCTION OF THESE STAIN FORMATORS BY IMPREGNATION IN THE PRESENCE OF PURE HYDROGEN UNDER PRESSURE, AT RELATIVELY LOW TEMPERATURES, IN ORDER TO OBTAIN A HIGH RESOLUTION IMPREGNATED DRAWING. LARGE GLASS PHOTOMASKS, BEARING A HIGH RESOLUTION IMPREGNATED DESIGN AND INTENDED TO BE USED IN PHOTOLITHOGRAPHIC MANUFACTURING OPERATIONS, ARE PREPARED BY MIGRATION OF STAIN-FORMING IONS BY IMPREGNATION IN THE SURFACE OF A GLASS SUBSTRUCTION AND SUBSTRUCTION AGGLOMERATION OF THESE STAIN-FORMING IONS BY IMPREGNATION IN THE PRESENCE OF PURE HYDROGEN UNDER PRESSURE, AT RELATIVELY LOW TEMPERATURES, IN ORDER TO OBTAIN A HIGH RESOLUTION IMPREGNATED DESIGN. |
| priorityDate | 1981-11-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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