http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1385241-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-10 |
filingDate | 1972-01-21^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1975-02-26^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | GB-1385241-A |
titleOfInvention | Composite photo-sensitive elements |
abstract | 1385241 Photographic material: photomasks E I DU PONT DE NEMOURS & CO 21 Jan 1972 [21 Jan 1971 19 Nov 1971] 3084/72 Headings G2C and G2Y A light sensitive element comprises (a) a layer which is photo-hardenable by actinic radiation or which comprises a cross-linkable composition which undergoes decomposition upon exposure to actinic radiation to leave material in the unexposed areas which cross-links and hardens upon treatment with a basic cross-linking agent; and, in intimate surface contact therewith, (b) a macromolecular organic polymer layer which contains at least one dye or pigment and is essentially opaque to ultraviolet radiation and essentially transparent to visible actinic radiation. The layer (a) may be adherent to a cover sheet and the layer (b) adherent to a support film. The layer (b) which is soluble in the solvent used to develop layer (a) may comprise polystyrene, copolymers of vinylidene chloride and acrylonitrile, polyacrylates and polymethacrylates, polyamides and polyvinyl esters. Numerous examples of dyes and pigments suitable for incorporation into the layer (b) are given. Suitable photo-hardenable compositions are given in the Examples. The element may be used to produce a coloured mask by removing the support film laminating the element to a rigid support with the layer (b) nearest the support, exposing the layer (a) image-wise for actinic radiation, removing the cover sheet and removing the unexposed or exposed areas of the layer (a) and the portion of the layer (b) underlying the unexposed or exposed areas of layer (a). The photo-hardenable layer may comprise an azide (polyisoprene composition (Example 9), a gelatine (dichromate composition (Example 10), a diallyl isophthalate prepolymer (Example 12) or an acrylic monomer with an acrylic resin. The cross-linkable composition is a diazonium salt and an acrylic binder (Example 11) which is hardened after exposure and before development by treatment with ammonia fumes (see U.K. Specification 1324548). Layer (a) may contain a dye and layer (b) may contain a V.V. absorber. As developers there are used an aqueous solution of 2-(2-Butoxy) ethanol, actylphenoxyethoxy ethanol and sodium silicate (Example 1), an aqueous solution of isopropyl alcohol and sodium hydroxide (Example 8) and an aqueous solution of sodium borate decahydrate, octylphenoxy ethanol and 2-(2-butoxy ethanol) (Example 10). In example 6 photo-masks prepared from the above described light sensitive elements are used to expose photo-polymers and silver halide films. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4268601-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6706462-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1152294-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2130745-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8784985-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8557877-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4515877-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5922508-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4950577-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7678462-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8864898-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9069133-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8344088-B2 |
priorityDate | 1971-01-21^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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