http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2032125-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20688220cab72ad01902ff5223732946 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C5-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-18 |
| filingDate | 1978-10-20^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1980-04-30^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-2032125-A |
| titleOfInvention | A Method of Providing Contrast Reduction in Image Reproduction with a Diazotype Material and Diazotype Materials Adapted for the Application of said Method |
| abstract | Contrast is reduced in diazotype materials by image-wise exposing the material in conjunction with a photosensitive non-diazo print out material. A print-out mask which absorbs the radiation to which the diazo compound is sensitive is formed during exposure. The diazotype material comprises a layer containing at least one diazo compound and in said layer or another layer adjacent thereto or in close proximity therewith at least one photosensitive non-diazo compound by means of which by exposure to actinic radiation at least one substance can be formed that absorbs actinic radiation to which the diazo compound is sensitive. The print-out and diazotype materials may be separable. An arrangement is also disclosed in which the print-out material is in the original to which diazotype material is exposed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4677049-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5039592-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4863827-A |
| priorityDate | 1978-10-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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