| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_579d686c9ebed6a0217ebd0f270afc31 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B2205-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B6-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04C29-0092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04C25-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04C23-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B6-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2017-02-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ea2dd0539d75b8e0ccec1dd429535be |
| publicationDate |
2018-08-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
GB-2559615-A |
| titleOfInvention |
Cleaning method |
| abstract |
A method for cleaning a component for use in an ultra-high vacuum. The method comprises the steps of placing the component to be cleaned in a vacuum furnace chamber, plasma cleaning the component at a temperature of greater than about 80°C and evacuating the chamber to a pressure of less than about 10E-5mbar. Apparatus for performing such method and kits comprising said components are also provided. Also disclosed is use of a plasma to clean a component of a vacuum in a vacuum furnace at a temperature of greater than about 80°C. |
| priorityDate |
2017-02-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |