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filingDate 1961-05-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1965-02-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-982941-A
titleOfInvention Improvements in transistor amplifiers
abstract 982,941. Semi-conductor devices. TEXAS INSTRUMENTS Inc. May 1, 1961 [May 2, 1960], No. 15722/61. Heading H1K. [Also in Division H3]. An amplifier circuit having a high input impedance (see Division H3) is formed as a solid semi-conductor network, Fig. 4a. An N-type silicon substrata 100 is diffused with gallium to form a P-type layer 102, and then with phosphorus to give a further N- type layer in the regions 104, 120, 140, 144. Between the areas 120, 140 the wafer is only P-type material, and the wafer forms an amplifier the circuit of which is shown in Fig. 4b comprising a field effect transistor 104, 106, 108 coupled to a transistor 112, 120, 121 having a load resistance formed by the region 130. The collector 121 of this transistor is coupled via a Zener diode 140 to a second transistor 142, 144, 146 having a collector load 148. In place of silicon other materials such as germanium, gallium arsenisde, indium antimonide, can be used. In a modification, Fig. 4c (not shown) an amplifier is similarly formed comprising a field effect transistor connected to common collector transistor stage. In a further modification, Fig. 5a, further P and N areas 180, 194, 190 are included to form the field effect transistors of a low pass filter in a feedback path (Specification 982,942) the supply potentials being derived across a xener diode formed on the region 180. The competed wafer forms a feedback amplifier, Fig. 5b (not shown). The gate regions of the field effect transistors may be formed alternatively by alloy techniques. Specification 945,734 also is referred to.
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