http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000297091-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-14
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-02
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B61-00
filingDate 2000-01-25^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbbc5dcebf5aa3197bc2b582ef4a1afa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1259a85a0b8745b954ed6e7be36f88d2
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publicationDate 2000-10-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000297091-A
titleOfInvention Method for producing organosilicon compound
abstract PROBLEM TO BE SOLVED: To provide a method for producing an organosilicon compound by subjecting a silane compound having a Si-H bond to a wide range of organohalogen compounds without the use of an amine by a dehydrohalogenation reaction. SOLUTION: General formula: HSiR 1 Cl 2 (wherein, R 1 is a hydrogen atom, a chlorine atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group), and an organic halogen compound represented by the general formula: R 2 CH 2 X. Is subjected to a dehydrohalogenation reaction in the presence of a tertiary phosphine compound to obtain a compound represented by the general formula: R 4 CH 2 SiR A method for producing an organosilicon compound represented by 1 Cl 2 .
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008511711-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013508433-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011521006-A
priorityDate 1999-04-13^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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