| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1996-11-21^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2000-02-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000501201-A |
| titleOfInvention |
Method for reducing metal ions in photoresist compositions by chelating ion exchange resins |
| abstract |
(57) [Summary]nThe present invention provides a method of making photoresists containing very low concentrations of metal ions using a chelating ion exchange resin that has been treated to form a neutral ammonium salt or acid form. Also provided is a method for manufacturing a semiconductor device using the photoresist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010234339-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008038005-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019526668-A |
| priorityDate |
1995-11-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |