| abstract |
PROBLEM TO BE SOLVED: To provide a chemically amplified resist sensitive to actinic radiation typified by far ultraviolet rays, which has high transparency to radiation and has basic dry etching resistance, sensitivity, resolution, pattern shape and the like. Provided is a radiation-sensitive resin composition having excellent physical properties and excellent storage stability as a composition. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin represented by a copolymer comprising each repeating unit represented by the following formula (1) or (2), and (B) a radiation-sensitive acid generator. Agent. Embedded image Embedded image |