http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001060432-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-361 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-351 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24 |
| filingDate | 1999-08-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ce4581c4ad3c601edf06a372fb30efa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e74008f242497c8c60bf4a24cc6c6e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44fb94033122ffee835d764e767f380f |
| publicationDate | 2001-03-06^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001060432-A |
| titleOfInvention | Plasma display panel manufacturing method and plasma display panel |
| abstract | PROBLEM TO BE SOLVED: To provide a plasma display panel manufacturing method capable of realizing simple and small-sized manufacturing equipment with few manufacturing steps. A transparent electrode is provided by providing a transparent electrode thin film on a front glass substrate, and irradiating a laser beam on the thin film continuously in the X direction and at predetermined intervals in the Y direction. It is formed leaving a thin film between the linear irradiation areas of the laser beam 64. The laser beam 64 is applied to an irradiation area 72 on a thin film to be irradiated with an arbitrary laser beam 64. And the irradiation area 7 on the thin film to be irradiated with the subsequent laser beam 2 is irradiated so as to be partially polymerized. Laser beam 6 It is necessary that the insulation resistance value of the linear irradiation region 4 is 10 MΩ or more. Is set to 5 μm or more. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7776229-B2 |
| priorityDate | 1999-08-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559532 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24404 |
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