http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001174949-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C5-02 |
| filingDate | 1999-12-21^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69b159bb9df8bd0e3100fc700fda6ce0 |
| publicationDate | 2001-06-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001174949-A |
| titleOfInvention | Coating manufacturing method of photothermographic material, coating manufacturing apparatus and photothermographic material |
| abstract | PROBLEM TO BE SOLVED: To provide a coating production method and a coating production apparatus for efficiently reducing the amount of residual solvent in a coating film of a photothermographic material and applying the coating surface of a photosensitive layer satisfactorily and stably. That is. It is another object of the present invention to provide a coating production apparatus having a durable photosensitive layer coating coater. SOLUTION: In a method for coating and producing a photothermographic material having a photosensitive layer on one surface of a support and a non-photosensitive layer on the back surface of the support opposite to the photosensitive layer, the photosensitive layer is first formed. Coating, and thereafter, applying a non-photosensitive layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004101883-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005131635-A |
| priorityDate | 1999-12-21^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Showing number of triples: 1 to 235 of 235.