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filingDate 2000-04-20^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9e5683f50c687dc1c25338a3e6180ea
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publicationDate 2001-11-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001305734-A
titleOfInvention Photopolymerizable composition
abstract [Problem] CTP excellent in workability, economy and storage stability Provided is a photopolymerizable composition used as a material for a lithographic printing plate for scanning exposure or an original plate for a lithographic printing plate having high sensitivity to the oscillation wavelength of an inexpensive short-wavelength semiconductor laser suitable for the system. SOLUTION: It is not sensitive to light of 500 nm or more, and 350 n corresponding to a short wavelength laser having an exposure light source wavelength from m to 450 nm, (i) an electron donating initiator and a sensitizing dye, (ii) an electron-accepting initiator and a sensitizing dye, and (iii) one of an electron-donating initiator, a sensitizing dye, and an electron-accepting initiator (ternary initiator). A photopolymerizable composition characterized by containing.
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