http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001356494-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-06-14^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddbbd3c6a0f4ad964d84c310b2a2ae71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e5a39a2271f5c6e79c582fd4f54ca02 |
| publicationDate | 2001-12-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001356494-A |
| titleOfInvention | Processing method of photosensitive lithographic printing plate |
| abstract | (57) [Problem] To provide a method for processing a photosensitive lithographic printing plate capable of obtaining a lithographic printing plate having good printing durability and stain prevention performance. SOLUTION: A photosensitive lithographic printing plate comprising a photosensitive layer provided on an aluminum support having a Si atom deposition amount of 0.1 to 8 mg / m 2 is exposed to light, and a non-reducing sugar and a base (provided that silicate is used). A photosensitive lithographic printing plate, characterized in that desensitization treatment is carried out in two or more treatment baths after development with a developer containing |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7795197-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006062005-A1 |
| priorityDate | 2000-06-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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