| abstract |
(57) Abstract: An active matrix substrate on which an electrostatic protection circuit is mounted can be manufactured by four photolithography steps. Kind Code: A1 A method for forming a TFT on an insulating substrate, comprising the steps of: laminating a material film constituting the TFT on an insulating film substrate to form a film; Forming a resist pattern having a first resist mask 15 and a second resist mask 16) on the uppermost layer of the material film, and forming a plurality of materials of the material film laminated using the resist pattern as an etching mask. Processing the film. By using this method, a photolithography step for connecting a lower first conductive layer such as a TFT gate electrode to an upper second conductive layer such as a source / drain electrode of a TFT is shortened. Let it. |