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filingDate 2002-01-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3457eac6026cffdf9ebcd2e45a206c
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publicationDate 2002-08-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002237653-A
titleOfInvention GaN surface emitting laser diode having spacer for effective hole diffusion between P-type electrode and active layer, and method of manufacturing the same
abstract (57) Abstract: A GaN surface emitting laser diode is provided. SOLUTION: The surface emitting laser diode of the present invention has an active layer 40 in which light is generated, and a p-layer opposed to the active layer. -Type material layer m1, n-type material layer m2, and n-type material layer m2 The first Bragg reflective layer 49 formed thereon and the n-type material layer m2 formed around the first Bragg reflective layer 49 and provided to cover the first Bragg material layer 49. Formed on the p-type electrode 47 and the p-type material layer m1, A spacer 48 having a thickness such that holes can smoothly move to the center of the active layer 40 and having a laser emission window 48b on a region corresponding to the first Bragg reflection layer 49; A spacer 54 is formed so as to surround the formed second Bragg reflection layer 52 and the laser emission window 48b. A laser emission window 48 comprising a p-type electrode 50 formed thereon; b is characterized in that the laser diffraction by the spacer 54 is offset.
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