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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-36
filingDate 2001-07-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0e8bc2c8e732635fbc37e40b16aec50
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publicationDate 2003-01-31^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003031844-A
titleOfInvention Method for manufacturing semiconductor light emitting device
abstract (57) [Problem] To provide a method for manufacturing a semiconductor light emitting device which has good crystallinity and can be miniaturized without increasing the number of steps. A method of manufacturing a semiconductor light emitting device including a crystal layer, a first conductivity type layer, an active layer, and a second conductivity type layer on a substrate, wherein a metal layer is formed on the second conductivity type layer. Separation is performed for each element by etching using the metal layer as a mask. According to the method for manufacturing a semiconductor light emitting element as described above, the element is separated by etching using the metal layer as a mask, so that the element can be separated with high accuracy and the element can be miniaturized.
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