| abstract |
(57) [Problem] To provide a novel organic compound which can be used for a resist material capable of producing a high-sensitivity and high-resolution pattern. SOLUTION: The compound of the present invention is an organic compound having an acid dissociable functional group, for example, as represented by the following formula. The organic compound of the present invention has an extremely small molecular size (about several hundreds to several thousands) as compared with a polymer compound, and can form a pattern with high sensitivity and high resolution by utilizing chemical amplification. By dissolving the organic compound and the acid generator of the present invention in a solvent and applying the solution on a silicon substrate or the like, a resist material of an amorphous thin film can be formed to form a resist substrate. A pattern with high sensitivity and high resolution can be formed by irradiating the resist substrate with light, an electron beam or radiation to draw and developing the resist substrate using an alkali developing solution. Embedded image |