| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2001-12-17^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9374f4123bd8b1b64d636e0d35cca04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cb048b86304949d908d7c33ed66073c |
| publicationDate |
2003-07-03^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003186195-A |
| titleOfInvention |
Negative resist composition |
| abstract |
(57) To provide a negative resist composition which can achieve both high sensitivity and high resolution and is excellent in isolation performance. (A) A compound that generates an acid upon irradiation with actinic rays or radiation, (B) a resin that is soluble in an alkaline aqueous solution, (C) an acid generated by component (A), and the resist film A compound having an alcohol structure that lowers alkali solubility, (D) a crosslinking agent that is excited by an acid generated by component (A) to cause a crosslinking reaction, and (E) A negative resist composition comprising a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011104127-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016124493-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9994538-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9469941-B2 |
| priorityDate |
2001-12-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |