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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3b0a3dbf8d6c9712d86ea1383fd5327
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-08
filingDate 2002-01-08^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670fbf340840ebaff8a02449b58cdbcb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7c4e4231d125f3446eef4963f6209a0
publicationDate 2003-07-22^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003206288-A
titleOfInvention Solution raw material for metalorganic chemical vapor deposition containing copper complex, copper (II) β-diketonate complex, and copper thin film produced using the same
abstract (57) [Summary] [Problem] It has excellent thermal stability, is hardly decomposed in a stored state, and has a long life. The MOCVD apparatus is hardly corroded and does not complicate exhaust gas treatment in the MOCVD process. Excellent adhesion to the underlayer. SOLUTION: First and second ligands are formed by coordinating to copper atoms, respectively, the first and second ligands have the same basic skeleton, and each of the ligands is A copper complex having one or more atomic groups branched from a basic skeleton and having a structure in which an atomic group of a first ligand and an atomic group of a second ligand are different from each other. Β of copper (II) represented by the following formula (1) It is a solution raw material for organometallic chemical vapor deposition in which a diketonate complex is dissolved in an organic solvent. Embedded image Here, R 1 is an isopropyl group, and R 2 is an ethyl group.
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type http://data.epo.org/linked-data/def/patent/Publication

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