| abstract |
(57) To provide a radiation-sensitive resin composition having high transparency to radiation, particularly few development defects, and excellent basic physical properties as a resist such as sensitivity, resolution, and pattern shape. The radiation-sensitive resin composition comprises (A) bis (4-t-butylphenyl) iodonium 2- (bicyclo [2.2.1] heptan-2-yl) -1,1,2, 2-tetrafluoroethanesulfonate, N- [2- (Bicyclo [2.2.1] heptan-2-yl) -1, 1,2,2-tetrafluoroethanesulfonyloxy] A radiation-sensitive acid generator typified by bicyclo [2.2.1] hept-5-ene-2,3-dicarboximide, And (B) a resin having a repeating unit derived from t-butyl bicyclo [2.2.1] hept-2-ene-5-carboxylate and / or 2-methyladamantan-2-yl (meth) acrylate It contains a resin that becomes alkali-soluble by the action of a representative acid. |