http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004109960-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-11-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 |
| publicationDate | 2004-04-08^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004109960-A |
| titleOfInvention | Intermediate layer composition for multilayer resist process and pattern forming method using the same |
| abstract | An intermediate layer composition and a pattern for a multilayer resist process, which are soluble in an organic solvent, excellent in storage stability, and excellent in bottoming shape, line edge roughness, and pattern peeling of the upper resist at the time of upper resist patterning A forming method is provided. An interlayer composition for a multilayer resist process comprising a silicon-containing polymer (A) having a specific structure, and a pattern forming method using the same. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007218943-A |
| priorityDate | 2002-07-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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