| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2002-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23cfb055bf88286becaa503a8173bab7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac0718ae5232ffcd9bd7648780e409bc |
| publicationDate |
2004-07-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004198944-A |
| titleOfInvention |
Resist material and pattern forming method |
| abstract |
(A) A polymer compound having a repeating unit of the formula (1) and having an acid labile group, Embedded image (B) an acid generator such as (5- (4-methylphenyl) sulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl) acetonitrile; (C) A resist material containing benzotriazoles and having an ultraviolet light having a wavelength of 300 nm or more as an exposure light source. EFFECTS OF THE INVENTION By using the composition of the present invention, particularly when forming a thick positive resist pattern by exposure to ultraviolet rays of 300 nm or more on a metal-coated substrate, high sensitivity and high resolution can be obtained. A resist pattern can be formed stably. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2551722-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013047786-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106019833-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10365560-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015064556-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015064556-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017032983-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3343293-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101034347-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015064555-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015064555-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8980525-B2 |
| priorityDate |
2002-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |