| abstract |
In a photosensitive resin composition containing an alkali-soluble resin and a photosensitive agent, a thin film having good light transmittance can be obtained while maintaining the flatness of the film surface even after high-temperature baking, and stable over time. To provide a photosensitive resin composition that is particularly suitable for forming an interlayer insulating film, a planarizing film, and the like, and a flat panel display and a semiconductor element using the same. In a photosensitive resin composition containing an alkali-soluble resin, a sensitizer having a quinonediazide group, and a curing agent, the alkali-soluble resin is an acrylic resin, and the sensitizer having a quinonediazide group is represented by the following general formula (I): And a naphthoquinone diazide compound, wherein the curing agent contains an epoxy group. The photosensitive resin composition further contains a phenolic compound and a curing accelerator as necessary. (Wherein R 1 , R 2 , R 3 and R 4 each independently represent H or a C 1 -C 2 alkyl group, and R 5 and R 6 each independently represent C 1 -C 2. Represents an alkyl group of |