http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005255742-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
filingDate 2004-03-10^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cb325f92a1858f1c565cbfc944f4a33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9
publicationDate 2005-09-22^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005255742-A
titleOfInvention (Meth) acrylic acid polymer and radiation sensitive resin composition
abstract PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition free from swelling of pattern side walls and pattern collapse in a development process, and a (meth) acrylic acid polymer that can be used for this composition. A (meth) acrylic acid polymer contains a repeating unit represented by the following formula (1) and is characterized in that the solubility in an alkali solution can be controlled by the action of an acid. [Chemical 1] (In the formula, R 1 represents a hydrogen atom or a methyl group, and each R 2 independently represents an alkyl group optionally having a linear or branched substituent having 1 to 4 carbon atoms, or 4 to 4 carbon atoms. 20 represents an alicyclic alkyl group or a monovalent hydrocarbon group in which two R 2 are bonded to each other and have an alicyclic skeleton having 4 to 9 carbon atoms, and X is a linear chain having 1 to 12 carbon atoms. Or a branched or branched linking group or an alicyclic linking group having 6 to 20 carbon atoms, and n represents an integer of 1 to 3) [Selection] None
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