| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_db0fd8f3b07befef010291e9e65290ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b4bae6d6cca15aaa13fe68481745ae2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a097e39d733ad9e52596b1575873b6ad |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-48 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2004-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de1c8ed8af4f786f254463f748416b69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a12abe3193b3c6d6bc88d8343c82b500
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e91c2090de2d9c480935b069b231643b |
| publicationDate |
2005-10-20^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005293854-A |
| titleOfInvention |
Power supply circuit for plasma generation, plasma generation apparatus, plasma processing apparatus, and object |
| abstract |
[Objective] A power supply circuit for plasma generation capable of smoothly obtaining a large amount of generated plasma without increasing the size of the apparatus, a plasma generation device, and a low cost for a large amount of objects to be processed using the plasma generation device A plasma processing apparatus capable of plasma processing and a target object having the target quality subjected to the plasma processing are realized. [Structure] One output of an alternating high voltage generating circuit for generating an alternating high voltage applied between each electrode of a discharge generating electrode comprising two or more first electrodes and one or more second electrodes; An LC series circuit in which a capacitor C and a coil L are connected in series is provided between one electrode. When a discharge occurs in any one of the electrode pairs, the voltage drop is suppressed by the coil even if the capacitor discharge progresses, and the discharge by the other electrode pair is also induced without being disturbed. Thus, a large amount of plasma can be generated smoothly. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4619967-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016031916-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013122876-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009105030-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4680095-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008238145-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016507255-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007234295-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009084591-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007234274-A |
| priorityDate |
2004-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |