http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005308940-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_67f2bb9a79bd8433343ae221f81551cf |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
| filingDate | 2004-04-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16a39135dff876ec7d9bddaf4719bf5b |
| publicationDate | 2005-11-04^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005308940-A |
| titleOfInvention | Photothermographic material for heat development |
| abstract | PROBLEM TO BE SOLVED: To provide a photothermographic material having improved humidity dependency, particularly humidity dependency during character line width development, and improved coatability. A photosensitive layer containing a non-photosensitive organic silver salt, a photosensitive silver halide, a reducing agent and a nucleating agent is provided on a support, and the following general formula ( 1. A heat-developable photographic light-sensitive material comprising the compound represented by 1). Formula (1) LiO 3 S- (CF 2) n -SO 3 Li In the formula, n represents an integer of 1 to 4. In addition, it is a preferable aspect to have an acrylic hydrophobic resin layer containing at least one of microcrystalline wax and paraffin wax as the outermost layer. [Selection figure] None |
| priorityDate | 2004-04-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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