http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005500691-A

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filingDate 2002-08-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-01-06^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005500691-A
titleOfInvention Providing optical control of semiconductor devices carried on a wafer
abstract Disclosed is a method for controlling light flow of a wafer relative to a semiconductor wafer (1700) having a substrate (1720), at least one active layer (1765), and at least one surface layer (1710). Control of the light flow is achieved by forming trenches (1725) and / or insulating implants (1730) in the wafer (1700) so that trenches (1725) acting as non-conductive areas (1750) are active regions (1760). ) Can be realized. Also disclosed are methods and systems for WLBI (wafer level burn-in) of semiconductor devices. Control of light flow at the wafer level is important when using the method and system for WLBI.
priorityDate 2001-08-13^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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