http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006012332-A

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filingDate 2004-06-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5eb21b4917bde25da1c56c2a425059c
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publicationDate 2006-01-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006012332-A
titleOfInvention Dry etching method, magnetic recording medium manufacturing method, and magnetic recording medium
abstract A dry etching method capable of processing a layer to be etched into a desired concavo-convex pattern shape with high accuracy, a method of manufacturing a magnetic recording medium using the same, and a recording layer formed with the concavo-convex pattern, ensuring good magnetic properties An obtained magnetic recording medium is provided. A recording layer (etched layer), a main mask layer, and a sub mask layer are formed on a substrate in this order, and the sub mask layer is processed into a predetermined uneven pattern (S106), and then oxygen or ozone The main mask layer in the concave portion is removed by reactive ion etching using as a reactive gas (S108), and the recording layer in the concave portion is further removed by dry etching to process the concave / convex pattern (S110). The material of the main mask layer is mainly composed of carbon, and the material of the sub mask layer is a material whose etching rate for reactive ion etching in the main mask layer processing step (S108) is lower than that of carbon. [Selection] Figure 3
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