| abstract |
【Task】 Provided is a chemically amplified positive resist composition that is suitable for excimer laser lithography such as ArF and KrF, has various resist performances such as sensitivity and resolution, and is particularly excellent in line edge roughness. [Solution] At least one repeating unit selected from the group consisting of the following repeating units (1) to (4) and (9) having at least 3 branches bonded to the central core: A star polymer containing and having a weight average molecular weight of 1,000 to 100,000. [Selection figure] None |