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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 2004-08-02^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b7f0823e14d298246464a06931fe82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1669feac2601717e899f573554533325
publicationDate 2006-02-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006047501-A
titleOfInvention Photosensitive resin composition, photosensitive film for permanent resist, method for forming resist pattern, and printed wiring board
abstract PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a cured product having mechanical properties sufficiently superior to those of conventional ones, particularly a sufficiently high tensile strength. SOLUTION: The photosensitive resin composition of the present invention capable of achieving the above-mentioned object is composed of a component (A): a cyclic curing agent that can be ring-opened by heating and crosslinking itself, component (B); blocked in the molecule. A block curing agent having a group derived from an agent and capable of dissociating the group derived from the blocking agent upon heating, component (C); a photopolymerizable compound having an ethylenically unsaturated bond, and component (D); a photopolymerization initiator It contains. Containing [Selection] None
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