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publicationDate 2006-03-30^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006084799-A
titleOfInvention Antireflection film forming composition and wiring forming method using the same
abstract PROBLEM TO BE SOLVED: To provide an antireflection film forming material capable of increasing a difference in etching rate between a resist pattern and an antireflection film. (A) A composition for forming an antireflection film comprising a siloxane polymer containing a light absorbing compound group. [Selection figure] None
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