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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D171-02
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
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filingDate 2004-10-22^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d71db86958ca8dbf1703c45da05396c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c37094be8b82f5989fb61137e683337
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publicationDate 2006-05-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006120920-A
titleOfInvention Silica-based coating solution
abstract PROBLEM TO BE SOLVED: To provide a coating solution for forming a silica-based coating film capable of forming a silica-based coating film having a low dielectric constant and hardly causing a film decrease or a dielectric constant increase by a stripping solution. (A1) a reaction product obtained by hydrolyzing an alkyltrialkoxysilane, (A2) a reaction product obtained by hydrolyzing a trialkoxysilane, and (B) a polyalkylene glycol and its A coating liquid for forming a silica-based film, comprising at least one selected from the group consisting of terminal alkylated products. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015156514-A
priorityDate 2004-10-22^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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