| abstract |
A method of manufacturing a photomask blank in which a chromium-based material film is provided on a transparent substrate, and the temperature of an object to be sputtered during sputtering is controlled to 100 ° C. or less by sputtering the chromium-based material film. A method of manufacturing a photomask blank for film formation. [Effect] When a chromium-based material film is formed on a substrate, a chromium-based material film having a very low film stress can be formed by sputtering, so that a photomask blank is manufactured by forming the chromium-based material film. Photomask that can prevent exposure from changing greatly due to changes in film stress before and after forming a film pattern by processing the chromium-based material film, and to provide a photomask capable of high-accuracy exposure A blank can be manufactured stably. [Selection figure] None |