http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006220860-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2005-02-09^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d5c11a3d1f34c70d652adfe407b0655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e4a1bdb98fe8c4d168626d6e6299ce5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_665afa016a6ca2f280599408e65045a1 |
| publicationDate | 2006-08-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006220860-A |
| titleOfInvention | Pattern forming material, pattern forming apparatus and pattern forming method |
| abstract | PROBLEM TO BE SOLVED: To provide a high-definition pattern with good scratch resistance in a developer, excellent resolution and tent properties, excellent developability, no line width variation, chipping, and disconnection. A pattern forming material, a pattern forming apparatus including the pattern forming material, and a pattern forming method using the pattern forming material. The support has at least a photosensitive layer on the support, the haze value of the support is 5.0% or less, and the photosensitive layer has a binder, a polymerizable compound, and light. The exposed portion of the photosensitive layer containing at least a polymerization initiator, the polymerizable compound containing a compound having at least three polymerizable groups in the molecule, and exposing and developing the photosensitive layer The pattern forming material has a minimum energy of 0.1 to 20 mJ / cm 2 used for the exposure that does not change the thickness of the film after the exposure and development. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009223277-A |
| priorityDate | 2005-02-09^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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