http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007025057-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D413-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D263-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D263-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09B23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09B55-00 |
| filingDate | 2005-07-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e367067d47d2d8144848d09e62499be6 |
| publicationDate | 2007-02-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007025057-A |
| titleOfInvention | Photosensitive composition and novel compound used therefor |
| abstract | PROBLEM TO BE SOLVED: To provide a high sensitivity to an oscillation wavelength of an inexpensive short-wave semiconductor laser useful as a photosensitive layer of a lithographic printing plate precursor for scanning exposure suitable for a CTP system excellent in workability and economy, and broadly having a wavelength of 350 to 450 nm. Provided is a photosensitive composition using a novel photoinitiating system that is highly sensitive to wavelength. The present invention also provides a novel dye compound that can be used in a photosensitive composition that is highly sensitive to the oscillation wavelength of the shortwave semiconductor laser. (A) a sensitizing dye capable of emitting one or more electrons from a one-electron oxidant produced by one-electron oxidation; (B) an initiator compound capable of generating radicals, acids or bases; (C) a compound whose physical or chemical properties are irreversibly changed by at least one of radicals, acids and bases, Containing the photosensitive composition. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008018272-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113652705-A |
| priorityDate | 2005-07-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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