| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2006-04-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1de9d0c900185bec98c3884ac5cdc3b |
| publicationDate |
2007-10-25^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007281148-A |
| titleOfInvention |
Substrate cleaning method, semiconductor device manufacturing method, and cleaning device |
| abstract |
The present invention provides a substrate cleaning method capable of performing predetermined cleaning while suppressing deterioration of the substrate. Cleaning includes: an acid treatment step in which a substrate is brought into contact with a liquid or gas containing an acid having a pKa of -12 or less; and a supercritical treatment step in which the acid-treated substrate is brought into contact with a supercritical fluid. Wash by method. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11355362-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101103010-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7246305-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018198466-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102369424-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I763788-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018198466-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190129996-A |
| priorityDate |
2006-04-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |