| abstract |
Lift mechanism (124) for magnetron (70) and its corresponding use in plasma sputter reactor (30). A magnetron that rotates about the target axis (76) is controllably lifted away from the rear of the target (34) to compensate for sputter erosion. The device includes a drive source (84), a housing (94), a tank (118), a water tank (116), a fixed gear (92), a drive plate (96), a carrier (81), a magnetic yoke (80), an isolator (38 ), Adapter (36), shield (52), vacuum pump system (44), RF power supply (58), capacitive coupling circuit (60), gas source (46), mass flow controller (48), reactor wall (32 ), Magnet ring (114), DC power supply (54), pedestal electrode (40), wafer (42), clamp ring (50), inner magnetic pole (74), outer magnetic pole (78), follower shaft (102), follower gear ( 100), an idler gear (98), and a planetary scanning mechanism (90). [Selection] Figure 4 |