http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008015060-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ed0897e087fa147bc2eb075dbc8b9c1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2006-07-04^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e2fe002367cfcd7a5ce64efd1dc7f3d |
| publicationDate | 2008-01-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008015060-A |
| titleOfInvention | Photosensitive polyamic acid ester composition |
| abstract | The present invention provides a photosensitive polyamic acid ester composition having excellent room temperature aging stability, which is useful for the production of electric / electronic materials. (A) 100 parts by mass of a polyamic acid ester having a carbon-carbon unsaturated bond in R consisting of a repeating unit represented by the following general formula (1); and (B) 1 to 15 parts by mass of a photoinitiator. And (C) 30 to 600 parts by mass of a solvent, and a photosensitive polyamic acid ester composition. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023176172-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011123219-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010079209-A |
| priorityDate | 2006-07-04^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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