| abstract |
A thin film forming method for forming a highly functional thin film uniformly over a large area with high productivity and high performance, an article having the thin film, an optical film, and a dielectric coating for achieving the method An electrode and a plasma discharge treatment apparatus are provided. A dielectric-coated electrode in which a conductive base material is coated with a dielectric, and the porosity of the dielectric is 10% by volume or less. ] None |