| abstract |
The present invention relates to a substrate material, and there is a charging range having a voltage of −1.5 to +1.5 kV on the surface of the corresponding molded product, and the ratio to the total area is 95 to 100%. There is a charging range having a voltage of .5 to -2.5 kV and a charging range having a voltage of +1.5 to +2.5 kV, and their ratio to the total area is 0 to 5%, <-2.5 kV A substrate material characterized in that there is a charge range with a voltage of> and a charge range with a voltage of> +2.5 kV, the proportion of which is up to 1% of the total surface of the disk, from the substrate surface The potential is measured using a Monroe probe at a distance of 3.5 mm, the scanning range is 12 cm for each of the X-method and Y-direction, and 2 mm for each of the X-direction and Y-direction. Substrate for measuring potential at intervals To provide a fee. |