| abstract |
Disclosed is a radiation-sensitive resin composition that is excellent not only in resolution performance but also in resistance to pattern collapse even when a fine pattern having a line width of 90 nm or less is formed. A resin (A) and a radiation-sensitive acid generator (B) are contained, and the resin (A) essentially comprises the repeating unit (a-1) represented by the general formula (a-1). Sensation of being a polymer having at least one of repeating unit (a-2) represented by general formula (a-2) and repeating unit (a-3) represented by general formula (a-3) as a unit Radiation resin composition. (In general formulas (a-1) to (a-3), R 1 represents a hydrogen atom, R 2 represents an alkyl group having 1 to 12 carbon atoms, and R 3 represents an alkyl having 1 to 4 carbon atoms. Group.) [Selection figure] None |