| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2008-11-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_156cd0ccfd8d84e45134f77d4f5933a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c59485851f31050bab7984e3210153a |
| publicationDate |
2009-09-03^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009199058-A |
| titleOfInvention |
Compositions and methods for immersion lithography |
| abstract |
A novel composition for use in immersion photolithography is provided. The photoresist composition of the present invention preferably comprises two or more distinct materials that can be substantially immiscible with the resin component of the resist. Particularly preferred photoresists of the invention can reduce leaching of resist material into the immersion liquid that contacts the resist layer during the immersion lithography process. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010256879-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8632938-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015172765-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8742038-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8475997-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019194725-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8642244-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010002870-A |
| priorityDate |
2007-11-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |