| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2003-248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2003-241
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2998-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C26-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23B27-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-02 |
| filingDate |
2006-10-12^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2009-03-19^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009511744-A |
| titleOfInvention |
Method for producing improved molded article for polishing |
| abstract |
A method for treating a working surface of a polishing compact having a working surface. In order to remove the catalytic material and any foreign metal matrix material from the region adjacent to the work surface, the work surface of the abrasive compact or the region adjacent to the work surface is preferably 800 ° C. or less. At a temperature in contact with a gaseous environment containing a source of halogen gas or halide ions. |
| priorityDate |
2005-10-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |