| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2009-01-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ffe53f638eec2a80b39615c3468bfb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c50263ed94ea8a9aec6f6b4c0b1334a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a6564d37d593cb43a9d727ba2ef3bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c64bf1e627002819df6a4a811220b667 |
| publicationDate |
2010-08-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010170056-A |
| titleOfInvention |
Positive resist composition, resist pattern forming method using the same, and polymer compound |
| abstract |
Provided are a polymer compound having excellent solubility in an organic solvent and exhibiting good lithography properties, a positive resist composition using the polymer compound, and a method for forming a resist pattern. A base material component (A) and an acid generator component (B) whose solubility in an alkali developer is increased by the action of an acid are dissolved in an organic solvent (S). A structural unit (a0) derived from an acrylate ester containing a cyclic group containing a sulfonyl group in the side chain, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, A positive resist composition comprising a polymer compound (A1) having a structural unit (a5) derived from a (meth) acrylic acid ester having a specific structure. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053643-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011102380-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013100475-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012220572-A |
| priorityDate |
2009-01-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |